Surface Passivation of Industrial Crystalline Silicon Solar Cells

Herausgeber: John, Joachim

• Gebundenes Buch

Produktbeschreibung

This timely overview of silicon solar cell surface passivation, written by the leading experts in the field, is a key read for students and researchers working with silicon solar cells, as well as solar cell manufacturers.

Produktdetails

• Energy Engineering
• Verlag: Institution of Engineering & Technology
• Seitenzahl: 288
• Erscheinungstermin: 10. Januar 2019
• Englisch
• Abmessung: 236mm x 168mm x 20mm
• Gewicht: 544g
• ISBN-13: 9781785612466
• ISBN-10: 1785612468
• Artikelnr.: 48064226

Inhaltsangabe

* Chapter 1: Market position of PERC silicon solar cells
* Chapter 2: Introduction to surface passivation of industrial
crystalline silicon solar cells
* Chapter 3: Material properties of AlOx for silicon surface
passivation
* Chapter 4: Material properties of Al2O3 grown on Si: interface trap
density (Dit) and fixed charge density (Qf)
* Chapter 5: PECVD-AlOx
* Chapter 6: Atmospheric pressure chemical vapor deposition of aluminum
oxide for silicon surface passivation - background and materials
science
* Chapter 7: Al2O3 by atmospheric pressure chemical vapour deposition
* Chapter 8: Surface passivation of industrial PERC solar cells
* Chapter 9: Al2O3 passivation in industrial solar cells: n-PERT
* Chapter 10: Double-layer dielectric stacks for advanced surface
passivation of crystalline silicon solar cells
* Chapter 11: Hydrogenated amorphous silicon nitride (a-SiNx:H) as
surface passivation layer
* Chapter 12: Microwave PE CVD reactor and process for industrial high
throughput fabrication of aluminum oxide layers for solar cell
applications
* Chapter 13: Spatial atomic layer deposition of A12O3: Levitrack, a
one-pass ALD system with throughputs exceeding 6,000 wafers/h
* Chapter 14: Spatial Al2O3 ALD: from Lab to Fab