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This book examines the constantly transforming technology of ion implantation. Ion implantation is an advancing field, owing to the recognition of its several commercial undertakings. Enhancements in equipment, comprehension of beam-solid interplays, applications to novel materials, optimized characterization strategies and more current advancements to employ implantation of nanostructure formation point to novel directions for ion implantation are described in this all-inclusive book.