73,95 €
73,95 €
inkl. MwSt.
Sofort per Download lieferbar
payback
37 °P sammeln
73,95 €
73,95 €
inkl. MwSt.
Sofort per Download lieferbar

Alle Infos zum eBook verschenken
payback
37 °P sammeln
Als Download kaufen
73,95 €
inkl. MwSt.
Sofort per Download lieferbar
payback
37 °P sammeln
Jetzt verschenken
73,95 €
inkl. MwSt.
Sofort per Download lieferbar

Alle Infos zum eBook verschenken
payback
37 °P sammeln
  • Format: PDF

Uncertainty in key parameters within a chip and between different chips in the deep sub micron era plays a more and more important role. As a result, manufacturing process spreads need to be considered during the design process. Quantitative methodology is needed to ensure faultless functionality, despite existing process variations within given bounds, during product development. This book presents the technological, physical, and mathematical fundamentals for a design paradigm shift, from a deterministic process to a probability-orientated design process for microelectronic circuits. Readers…mehr

Produktbeschreibung
Uncertainty in key parameters within a chip and between different chips in the deep sub micron era plays a more and more important role. As a result, manufacturing process spreads need to be considered during the design process. Quantitative methodology is needed to ensure faultless functionality, despite existing process variations within given bounds, during product development. This book presents the technological, physical, and mathematical fundamentals for a design paradigm shift, from a deterministic process to a probability-orientated design process for microelectronic circuits. Readers will learn to evaluate the different sources of variations in the design flow in order to establish different design variants, while applying appropriate methods and tools to evaluate and optimize their design.

  • Trains IC designers to recognize problems caused by parameter variations during manufacturing and to choose the best methods available to mitigate these issues during the design process;
  • Offers both qualitative and quantitative insight into critical effects of process variation from perspectives of manufacturing, electronic design automation and circuit design;
  • Describes critical effects of process variation using simple examples that can be reproduced by the reader.



Dieser Download kann aus rechtlichen Gründen nur mit Rechnungsadresse in A, B, BG, CY, CZ, D, DK, EW, E, FIN, F, GR, HR, H, IRL, I, LT, L, LR, M, NL, PL, P, R, S, SLO, SK ausgeliefert werden.

Autorenporträt
Dr. Manfred Dietrich leitet die Abteilung Mikroelektronische Systeme am Fraunhofer Institut, Institutsteil Entwurfsautomatisierung, in Dresden. Seit Jahren ist diese Abteilung in verschiedenen Industrie- und Förderprojekten auf dem Gebiet des 3D-Entwurfs integriert; sie arbeitet also aktiv an vorderster Stelle auf diesem neuen Arbeitsfeld mit.