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The drive toward smaller and smaller electronic componentry of microelectronics is demanding new materials with higher electrical permittivity. An impressive collection of methods with in-depth coverage, High k Gate Dielectrics reviews the state-of-the-art in high permittivity gate dielectric research. Leading researchers from Europe and the USA describe various deposition techniques used for construction of layers at these dimensions, as well as characterization techniques of the physical, chemical, structural, and electronic properties. The book reviews theoretical work and also discusses technological applications. It serves as an excellent source of reference for researchers in high-K gate dielectrics.
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