VLSI TECHNOLOGY 2E (6/P) - Sze, Simon M.
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This is a superb state-of-the-art collection of contributed readings by nationally recognized authorities in VLSI technology. The emphasis of this text is on fabrication.
Table of contents:
Chapter 1: Crystal Growth and water prepreparation Chapter 2: Epitaxy Chapter 3: Oxidation Chapter 4: Lithography Chapter 5: Reactive Plasma Etching Chapter 6: Dielectric and Polysilicon Film Deposition Chapter 7: Diffusion, Ion Implementation Chapter 8: Metallization Chapter 9: Process Simulation Chapter 10: LSI Process Integration Chapter 11: Analytical Techniques Chapter 12: Assembly techniques and Packaging of VLSI Devices Chapter 13: Yield and Reliability…mehr

Produktbeschreibung
This is a superb state-of-the-art collection of contributed readings by nationally recognized authorities in VLSI technology. The emphasis of this text is on fabrication.

Table of contents:
Chapter 1: Crystal Growth and water prepreparation Chapter 2: Epitaxy Chapter 3: Oxidation Chapter 4: Lithography Chapter 5: Reactive Plasma Etching Chapter 6: Dielectric and Polysilicon Film Deposition Chapter 7: Diffusion, Ion Implementation Chapter 8: Metallization Chapter 9: Process Simulation Chapter 10: LSI Process Integration Chapter 11: Analytical Techniques Chapter 12: Assembly techniques and Packaging of VLSI Devices Chapter 13: Yield and Reliability