Theoretical evaluation of reflectance in AL/SiO2 thin films - Ortega Cabrera, Jesús Javier
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The improvement of the optical properties of a material, such as reflectance, involves the complex search for the optimal experimental parameters in the process of obtaining them. The use of computational software for the simulation of these thin film growth processes represents a substantial benefit due to the non dependence on a real system, as well as the possibility of exploring a wider range of physical quantities involved. In addition, there is a need in the automotive industry, Varroc Lighting Systems© has been given the task of improving the reflectance of aluminized headlights, so we…mehr

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Produktbeschreibung
The improvement of the optical properties of a material, such as reflectance, involves the complex search for the optimal experimental parameters in the process of obtaining them. The use of computational software for the simulation of these thin film growth processes represents a substantial benefit due to the non dependence on a real system, as well as the possibility of exploring a wider range of physical quantities involved. In addition, there is a need in the automotive industry, Varroc Lighting Systems© has been given the task of improving the reflectance of aluminized headlights, so we carried out the development, using NASCAM® software, which uses the Monte Carlo kinetic method to develop a model of the physical system to be studied on a nanometric scale, this will allow us to analyze the influence of different magnitudes that can affect the reflectance of the material.
Autorenporträt
Jesús Javier Ortega Cabrera: Master in de ingenieurswetenschappen met oriëntatie op materialen, School voor mechanische en elektrische engineering, Universidad Autónoma de Nuevo León.