Weimin Zhou

Nanoimprint Lithography: An Enabling Process for Nanofabrication

• Gebundenes Buch

Produktbeschreibung

Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It provides the exciting, multidisciplinary field, offering a wide range of topics covering: principles, process, material and application.
This book would be of specific interest for researchers and graduate students in the field of nanoscience, nanotechnology and nanofabrication, material, physical, chemical, electric engineering and biology.
Dr. Weimin Zhou is an associate professor at Shanghai Nanotechnology Promotion Center, China.

Produktdetails

• Verlag: Springer / Springer Berlin Heidelberg / Springer, Berlin
• Artikelnr. des Verlages: 978-3-642-34427-5
• 2013
• Seitenzahl: 272
• Erscheinungstermin: 4. Januar 2013
• Englisch
• Abmessung: 241mm x 160mm x 20mm
• Gewicht: 530g
• ISBN-13: 9783642344275
• ISBN-10: 3642344275
• Artikelnr.: 36558082

Autorenporträt

Weimin Zhou Received a Ph.D. degree in Microelectronics and Solid-State Electronics from Shanghai Jiao Tong University, China. He is currently a Professor of Nanomaterials and Nanoelectronics in Shanghai Nanotechnology Promotion Center. His research interests cover semiconductor nanomaterials (nanowires, carbon-based, phase change material), novel semiconductor or nano devices, and nanofabrication, and lithium ion battery, etc. He has authored or coauthored more than 30 papers in scientific journals and is the holder of four patents in the micro/nano electronics area and material Engineering. Some research achievement is highlighted by Nature Nanotechnlogy magazine. He is also a reviewer for many scientific magazines, such as Appl. Phys. Lett, Nanotechnolgoy. Education: 1996.9-2000.7 Anhui polytechnic University, major in mechanical engineering 2001.9-2003.7 Harbin institute of technology, material engineering. 2004.3-2007.3 Shanghai Jiao Tong University, major in Microelectronics and Solid-State Electronics 2007.4-2009.4 Postdoctral Fellow at Shanghai Institute of Microsystem and Information Technology         Work experience : 2004.3-2007.3 one -dimensional nanostructure and its application in nanodevices, Fabrication of semiconductor nanowrie/ nanotube, carbon nanotube 2007.4-2009.4 Nanoimprint lithography process and its application in light emitting diodes.   2009.4- now Associate Professor at Shanghai Nanotechnology Promotion Center Nanoimprint lithography and its application in nanodevices( biosensor, solar cell .et al )

Inhaltsangabe

Principles and statues of nanoimprint lithography.- Stamp Fabrication.- stamp surface treatment.- Nanoimprint lithography resists.- Nanoimprint lithography process.- Modeling and Simulation of NIL.- Application of NIL in Light emitting Diodes.- Application of NIL in memory devices.- Application of NIL in solar cell.