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Ellipsometry is a versatile and powerful optical technique for the investigation of the dielectric properties (complex refractive index or dielectric function) of thin films.It has applications in many different fields, from semiconductor physics to microelectronics and biology, from basic research to industrial applications. Ellipsometry is a very sensitive measurement technique and provides unequalled capabilities for thin film metrology. As an optical technique, spectroscopic ellipsometry is non-destructive and contactless.Upon the analysis of the change of polarization of light, which is…mehr

Produktbeschreibung
Ellipsometry is a versatile and powerful optical technique for the investigation of the dielectric properties (complex refractive index or dielectric function) of thin films.It has applications in many different fields, from semiconductor physics to microelectronics and biology, from basic research to industrial applications. Ellipsometry is a very sensitive measurement technique and provides unequalled capabilities for thin film metrology. As an optical technique, spectroscopic ellipsometry is non-destructive and contactless.Upon the analysis of the change of polarization of light, which is reflected off a sample, ellipsometry can yield information about layers that are thinner than the wavelength of the probing light itself, even down to a single atomic layer. Ellipsometry can probe the complex refractive index or dielectric function tensor, which gives access to fundamental physical parameters and is related to a variety of sample properties, including morphology, crystal quality, chemical composition, or electrical conductivity.