Current and Breakdown Voltages in 3C-SiC Lateral Power MOSFET
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Silicon carbide is the only WBG semiconductor that possesses a high-quality native oxide suitable for use as an MOS insulator in electronic devices. Thermal oxidation of SiC produces a layer of SiO2 on the surface, while the carbon atoms from the SiC form CO, which escapes as a gas. Thus it is possible to make all the devices found in silicon IC technology in SiC, including high quality, stable MOS transistors and MOS integrated circuits.
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