Mohamed Elgamel, Magdy A. Bayoumi

Interconnect Noise Optimization in Nanometer Technologies

• Gebundenes Buch

Produktbeschreibung

Presents a range of CAD algorithms and techniques for synthesizing and optimizing interconnect

Provides insight & intuition into layout analysis and optimization for interconnect in high speed, high complexity integrated circuits.

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Produktdetails

• Verlag: Springer, Berlin
• Artikelnr. des Verlages: 11382577
• 2006
• Seitenzahl: 160
• Erscheinungstermin: 21. November 2005
• Englisch
• Abmessung: 241mm x 160mm x 15mm
• Gewicht: 436g
• ISBN-13: 9780387258706
• ISBN-10: 0387258701
• Artikelnr.: 20771945

Autorenporträt

Mohamed Elgamel, University of Louisiana, Lafayette, USA / Magdy Bayoumi, University of Louisiana, Lafayette, USA

Inhaltsangabe

Introduction.- Noise Analysis and Design in Deep Submicron.- Interconnect Noise Analysis and Optimization Techniques.- Crosstalk Noise Analysis in Ultra Deep Submicrometer Technologies.- Minimum Area Shield Insertion for Inductive Noise Reduction.- Spacing Algorithms for Crosstalk Noise Reduction.- Post Layout Interconnect Optimization for Crosscoupling Noise Reduction.- 3D Integration. - EDA Industry Tools: State of the Art.

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Noise Analysis and Design in Deep Submicron.- Interconnect Noise Analysis and Optimization Techniques.- Crosstalk Noise Analysis in Ultra Deep Submicrometer Technologies.- Minimum Area Shield Insertion for Inductive Noise Reduction.- Spacing Algorithms for Crosstalk Noise Reduction.- Post Layout Interconnect Optimization for Crosscoupling Noise Reduction.- 3D Integration.- EDA Industry Tools: State of the ART.

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Noise Analysis and Design in Deep Submicron.- Interconnect Noise Analysis and Optimization Techniques.- Crosstalk Noise Analysis in Ultra Deep Submicrometer Technologies.- Minimum Area Shield Insertion for Inductive Noise Reduction.- Spacing Algorithms for Crosstalk Noise Reduction.- Post Layout Interconnect Optimization for Crosscoupling Noise Reduction.- 3D Integration.- EDA Industry Tools: State of the ART.