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Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.…mehr

Produktbeschreibung
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.

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  • Produktdetails
  • Verlag: John Wiley & Sons
  • Seitenzahl: 272
  • Erscheinungstermin: 17. Mai 2013
  • Englisch
  • ISBN-13: 9781118747421
  • Artikelnr.: 38482726
Autorenporträt
Tommi Kääriäinen is a researcher at theAdvanced Surface Technology Research Laboratory (ASTRaL) inLappeenranta University of Technology (LUT), Finland. He has overnine years of experience in thin film deposition and analyticaltechniques. He has especially focused on atomic layer deposition(ALD) at low temperatures and recently on spatial and roll-to-rollALD. David Cameron received his BSc in electrical andelectronic engineering from the University of Glasgow in 1972. In2004, he joined LUT as Professor of Material Technology andDirector of ASTRaL. His research career has been in the area ofthin film deposition and since joining ASTRaL, his work has focusedon ALD. He has also worked on molecular beam epitaxy, plasmachemical vapour deposition, magnetron sputtering, and sol-geldeposition. Marja-Leena Kääriäinen has conducted ALDresearch for over 10 years. Her focus has been on the growth andstructure of nanoscale metal oxide films. She has a particularinterest in the photoactivity, photocatalytic activity, andantibacterial properties of ALD-grown thin films. Her background isin chemical engineering, which she studied at LUT and MichiganTechnological University. Currently, she is a researcher atASTRaL. Arthur Sherman has 60 years of industrial experience,which includes almost 20 years with General Electric, seven yearson the corporate staff of RCA, several years at Applied Materials,and six years at Varian Associates. He earned a master's degree inaeronautical engineering at Princeton University and a PhD at theUniversity of Pennsylvania. He has published extensively, includingapproximately 50 research papers published in archive journals andthree scientific monographs.