Updates in Advanced Lithography
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  • Gebundenes Buch

Advanced lithography grows up to several fields such as nano-lithography, micro electro-mechanical system (MEMS) and nano-phonics, etc. Nano-lithography reaches to 20 nm size in advanced electron device. Consequently, we have to study and develop true single nanometer size lithography. One of the solutions is to study a fusion of top down and bottom up technologies such as EB drawing and self-assembly with block copolymer. In MEMS and nano-photonics, 3 dimensional structures are needed to achieve some functions in the devices for the applications. Their formation are done by several methods…mehr

Produktbeschreibung
Advanced lithography grows up to several fields such as nano-lithography, micro electro-mechanical system (MEMS) and nano-phonics, etc. Nano-lithography reaches to 20 nm size in advanced electron device. Consequently, we have to study and develop true single nanometer size lithography. One of the solutions is to study a fusion of top down and bottom up technologies such as EB drawing and self-assembly with block copolymer. In MEMS and nano-photonics, 3 dimensional structures are needed to achieve some functions in the devices for the applications. Their formation are done by several methods such as colloid lithography, stereo-lithography, dry etching, sputtering, deposition, etc. This book covers a wide area regarding nano-lithography, nano structure and 3-dimensional structure, and introduces readers to the methods, methodology and its applications.
  • Produktdetails
  • Verlag: IntechOpen
  • Seitenzahl: 262
  • Erscheinungstermin: 3. Juli 2013
  • Englisch
  • Abmessung: 266mm x 185mm x 22mm
  • Gewicht: 782g
  • ISBN-13: 9789535111757
  • ISBN-10: 9535111752
  • Artikelnr.: 57090210