Toshiaki Makabe, Zoran Lj. Petrovic

Gebundenes Buch

Plasma Electronics

Applications in Microelectronic Device Fabrication

Beschreibung

More than two decades have passed since the first edition of Plasma Electronics was published. Today, we are entering an era that demands increasingly sophisticated control and design of plasma sources and related surface technologies for micro- and nano-electronic device fabrication. Plasma technology, based on surface interactions, continues to expand into emerging fields including biotechnology, medical science, and environmental applications. Plasma Electronics: Applications in Microelectronic Device Fabrication, Third Edition, explains the fundamental physics and numerical methods essential for advancing these technologies from laboratory research to manufacturing-scale modeling and design of plasma sources and processes. This comprehensive resource has established itself as the standard reference for scientists, engineers, and graduate students working with weakly ionized, non-equilibrium plasmas. The book begins with a brief history of elementary processes and collective properties in low-temperature plasma, providing readers with essential context for understanding current developments and future prospects. Beyond traditional plasma knowledge, the content is systematically organized to enable quantitative understanding of surface-reactive plasmas through collision physics in gases and on surfaces, stochastic Boltzmann equation applications, electron and ion kinetics fundamentals, computational physics methodologies and plasma source design and optimization. The text addresses practical challenges head-on, including predictive modeling of spatiotemporally changing surfaces in contact with plasma through advanced numerical methods and control strategies. This approach ensures readers can apply theoretical knowledge to real-world manufacturing scenarios. Applications of negative charges generated in a low-temperature plasma will open up the world with innovative technologies. In this third edition, macroscopic functions of negative charges are added and elucidated for representative examples, including negative charge injection into a micro-structured surface on the electrode and the sustainability of active bulk plasma. This book remains a unique and indispensable resource for researchers and engineers seeking to master radiofrequency collisional plasmas and their structure, function, and applications in today's rapidly evolving technological landscape. Key Features: · Provides essential fundamental physics and advanced numerical methods that enable researchers to transition plasma technologies from laboratory to factory. · Provides systematic coverage of surface-reactive plasma physics. · Addresses expanding plasma technology applications across biotechnology, medical science, and environmental fields.

Autor

Toshiaki Makabe received his BSc, MSc, and Ph.D. degrees in electrical engineering all from Keio University. He became a Professor of Electronics and Electrical Engineering in the Faculty of Science and Technology at Keio University in 1991. Zoran Lj. Petrovi¿ obtained his Master 's degree in the Department of Applied Physics, Faculty of Electrical Engineering at the University of Belgrade, and earned his Ph.D. from Australian National University.

Produktdetails

• Verlag: Taylor & Francis Ltd
• 3. Auflage
• Seitenzahl: 444
• Erscheinungstermin: 20. Mai 2026
• Englisch
• Abmessung: 234mm x 156mm
• ISBN-13: 9781041192237
• ISBN-10: 1041192231
• Artikelnr.: 75830330

Rezensionen

"This text serves both the expert and the newcomer with background and state-of-the-art knowledge of plasma electronics. It should be on the bookshelf of anyone exploiting plasma technology for device fabrication. Clearly written and well illustrated, it is also suitable as a postgraduate teaching text and, having been updated, may be a standard reference for the next decade."
-Nigel J. Mason, Professor, Department of Physical Sciences, The Open University

"This book is a unique and invaluable source of insight and clarity with special strengths in treating charged particle-neutral collisions, rigorously generalized with proper kinetic theory. This rigor in analyzing discharge physics fundamentals makes the subsequent

treatment of plasma modeling and surface modification applications in microelectronics even more valuable. It will no doubt become a standard reference for all scientists and engineers interested in weakly ionized, non-equilibrium plasmas."
-David B. Graves, Professor and Lam Research Distinguished Chair, Department of Chemical and Biomolecular Engineering, University of California, Berkeley

"... unique in the low-temperature plasma literature for the breadth of its aims and wide-ranging scope, and I would strongly recommend as a reference for postgraduate students in the field."
-Robert E. Robson, Professor, James Cook University

"This book discusses the fundamental principles of partially ionized, chemically reactive plasma discharges and their use in thin film processing ... a well-written book for plasma engineers and scientists. ... [they] will benefit a lot from this book ..."
-Hong-Young Chang, Professor, Korean Advanced Institute of Science and Technology (KAIST)

"A unique textbook written by two of the most outstanding scientists in the field ... A very valuable part of the book is devoted to modeling and numerical simulation ... an indispensable source of knowledge and an excellent reference for all kinds of basic phenomena."
-Uwe Czarnetzki, Professor and Chair, Faculty of Physics and Astronomy, Ruhr-Universität Bochum

"The book offers a truly excellent account on the fundamental physics of low-temperature plasmas and applications of low-temperature plasmas to other scientific disciplines and technologies. I strongly recommend this book to both newcomers as a high-standard introductory textbook and experts as a comprehensive reference."
-Satoshi Hamaguchi, Professor, Center for Atomic and Molecular Technologies, Osaka University