Micromirror Technology for Maskless Lithography
Yijian Chen
Broschiertes Buch

Micromirror Technology for Maskless Lithography

Dynamics, Control and Fabrication

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This book presents a complete analysis and review of dynamics, control and fabrication of MEMS micromirrors for applications in DUV and EUV maskless lithography. The transient and resonant behavior of various types of electro-mechanically damped micromirrors with various degrees of freedom are discussed. The theoretical approach using the perturbation method and linear control theory is described. Micromirror design and fabrication issues including the material properties, process integration, and device reliability are addressed. Novel processing solutions such as the self-aligned spacer patt...