Lithography Free Nanopatterning of PS-b-PDMS Block Copolymer
Dipu Borah
Broschiertes Buch

Lithography Free Nanopatterning of PS-b-PDMS Block Copolymer

Prospects and Challenges

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Semiconductor device performance has been subject to continuing improvements over the years, largely due to a reduction of device dimensions as a consequence of improving resolution limits of "top-down" lithographic processes used in device fabrication. However, further progress is critically related to several issues including source design, material interactions and thermal management. "Bottom-up" approaches, based on hierarchical self-assembly of block copolymer (BCP) are the subject of intense research at present. It is highly challenging to achieve long-range translational order and robus...