High-k materials in Dynamic Random Access Memories (DRAM)
Atomic scale engineering of HfO2-based dielectrics for future DRAM applications
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I would like to give you an outstanding opportunity to experience more about modern materials for Dynamic Random Access Memories. Therefore I give this book into your hands. You will find here a theory chapter focusing on DRAM physics as well as a deep description of deposition and characterization methods used in this work. Finally, you will discover how to engineer materials on an atomic scale and how to investigate those thin films.
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