Electrical Characterization of ZnO thin films grown by molecular beam epitaxy
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For the electronic and optoelectronic device realization a precise control of the electrical properties in the utilized material is a very important issue. Doping profiles in realized p-njunctions influence the functionality of the devices. The morphological and crystal properties of a device material directly influence the electrical ones. Dislocations present in a region of p-n-junctions can short circuit them leading to malfunctions. Too rough surfaces during epitaxial growth could lead to inhomogeneities in a single or multiple quantum wells and superlattices.
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