Development, Design and Analysis of Type-II Hetero-Strained Nanosystem

Development, Design and Analysis of Type-II Hetero-Strained Nanosystem

Analysis of Type-II Hetero-Strained Nanosystem

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This book investigates the advancement and analysis of strained channel cylindrical gate-all-around (CGAA) FETs. The study explores a nano-scale design incorporating three ultrathin strained layers: two outer layers of strained silicon (s-Si) and a middle layer of strained silicon germanium (s-SiGe), forming a heterostructure-on-insulator (HOI) within the CGAA FET. These strained layers in the channel effectively confine quantum carriers, thereby enhancing carrier mobility and reducing threshold voltage roll-off.