DC Magnetron Sputtered Aluminum doped ZnO Thin Films
For Optoelectronic Devices
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Highly conductive and transparent films have many important applications such as transparent electrodes for optoelectronic devices and transparent heat mirrors for solar energy utilization. Although indium-tin-oxide (ITO) thin films are generally used for practical applications, ITO is a relatively expensive material because indium is not abundant. Recently Al-doped ZnO thin films have attracted interest as a transparent and conductive coating material because the low cost of this material makes it attractive for large-scale applications. In this book, the optimized deposition conditions for t...
Highly conductive and transparent films have many important applications such as transparent electrodes for optoelectronic devices and transparent heat mirrors for solar energy utilization. Although indium-tin-oxide (ITO) thin films are generally used for practical applications, ITO is a relatively expensive material because indium is not abundant. Recently Al-doped ZnO thin films have attracted interest as a transparent and conductive coating material because the low cost of this material makes it attractive for large-scale applications. In this book, the optimized deposition conditions for the preparation of Al-doped ZnO thin films by reactive DC magnetron sputtering method will be discussed. The structural, surface morphological, electrical, and optical properties of Al-doped ZnO thin films were reported systematically.
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